Books & Journals

SOI Materials and Devices, S. Cristoloveanu and G. K. Celler, Chapter 4 of Handbook of Semiconductor Manufacturing Technology, 2nd edition, edited by R. Doering and Y. Nishi (CRC Press, Taylor and Francis Group, Boca Raton, Fl, 2007), pages 4-1 to 4-52

Low temperature diffusion of impurities in hydrogen implanted silicon, S. Personnic, K. K. Bourdelle, and F. Letertre, A. Tauzin and F. Laugier, R. Fortunier and H. Klocker, J. Appl. Phys. 101, 083529 (April 2007). (Soitec, CEA-LETI)

Observation of Threshold-Voltage Instability in Single-Crystal Silicon TFTs on Flexible Plastic Substrate, Hao-Chih Yuan, George K. Celler, and Zhenqiang Ma ,IEEE Electron Device Letters, 28 (7), pp. 590-592  (July 2007). (U.Wisconsin-Madison, Soitec)

Study of HCl and Secco Defect Etching for Characterization of Thick sSOI, A. Abbadie, S. W. Bedell, J. M. Hartmann, D. K. Sadana, F. Brunier, C. Figuet, and I. Cayrefourcq, J Electrochem Soc. 154 (8), H713-H719 (2007). (Soitec, IBM, LETI)

Comparison of platelet formation in hydrogen and helium-implanted silicon, X. Hebras, P. Nguyen, K. K Bourdelle, F. Letertre, N. Cherkashin, and A.Claverie, Nuclear Inst. and Methods in Physics Research B, 262,  pp. 24-28 (Aug. 2007).  (Soitec, CEMES/CNRS)

Quantitative study of hydrogen-implantation-induced cavities in silicon by grazing incidence small angle x-ray scattering, Luciana Capello, F. Rieutord, A. Tauzin, and F. Mazin, J. Appl. Phys. 102, 026106 (July 2007). (CEA-Grenoble & LETI)

Structure of elastically strain-sharing silicon (110) nanomembranes, A C Opotowsky, S. A. Scott, C. S. Ritz, D. E. Savage, G. K. Celler, and M. G. Lagally, New J. Phys. 9, 270 doi:10.1088/1367-2630/9/8/270 (Aug.2007). (U.Wisconsin-Madison, Soitec)

7.8-GHz flexible thin-film transistors on a low-temperature plastic substrate,  H-C.Yuan, G. K. Celler, Z. Ma, J.Appl. Phys. 102 034501 (Aug. 2007). (U.Wisconsin-Madison, Soitec)

Effects of high-temperature anneals and 60Co gamma-ray irradiation on strained silicon on insulator, K. Park, M. Canonico, G. K. Celler, M. Seacrist, J.Chan, J. Gelpey, K. E. Holbert, S. Nakagawa and M. Tajima, and D. K. Schroder. J. Appl. Phys. 102, 074507 (Oct. 2007). (Arizona State U., Freescale, Soitec, MEMC, Mattson, JAXA)

Leave a Reply

Your email address will not be published. Required fields are marked *