Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors

5-10 July 2009, Xi’an, China

  • High Scalability and Low Variability of Planar Fully Depleted SOI MOSFETS
    O. Weber (CEA-Leti)
  • Substrate Engineering for 32nm and Beyond
    B.-Y. Nguyen, et al. (Soitec)
  • SOI/Nanostructure Platform for Gas Sensing
    W. I. Milne, et al. (Cambridge U./UK; ETRI; Aixtron)

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