FD-SOI in China – Foundries See Interest Mounting Fast

The foundries sent their top guns to the FD-SOI Forums organized by the SOI Consortium and its members in Shanghai and Nanjing. This is a quick recap of what they said.

GF: Winning with SOI

“With FD-SOI, we can deliver a level of integration never before possible,” said GlobalFoundries CEO Sanjay Jah in his Shanghai talk, Winning With SOI. The ecosystem they’re building is covering both design and supply. He showed a video of the new fab, which is going up at an enormous speed in Chengdu, China. It’s huge: a half-kilometer long on one side. And it will start producing wafers in H218, ramping up to a million/year.

GlobalFoundries CEO Sanjay Jah citing key TAMs at the FD-SOI Forum in Shanghai. (Photo courtesy: SOI Consortium & GlobalFoundries)

FD-SOI is past the discovery phase now, he continued. They’ve got 135 engagements and 102 PDKs downloaded. In China alone, they have ten customers taping out 15 products. The key is going after high-growth markets, including mobility, IoT, RF/mmW and automotive (see picture above). “We see intelligence migrating to the edge,” he said.

With 22FDX®, there are 11 fewer mask steps than industry standard 28nm HKMG processes, he said. Back bias is a big differentiator, reaping benefits without penalties and shortening time-to-market. eMRAM is also a big driver of interest. The IP – both foundation and complex – is silicon-proven: you can measure it. The FDXceleratorTM program now has 35 partners.

He also touched on RF-SOI, where GF is #1 in terms of market share.

“I’m very excited about the future for us,” he concluded.

With back bias, you can do even more, said GF’s Sanjay Jha, so customers feel the risk is lower. (Photo courtesy: SOI Consortium & SOI Consortium)

In the Nanjing SOI forum, GF’s head of China sales, Zhi Yong Han gave an excellent presentation that is posted on the SOI Consortium website (you can get it here). He emphasized that they are educating designers to help them take advantage of the FD-SOI for advanced devices, as well and working with universities. The result is that they’re seeing significant growth in the Chinese market.

Slide 9 from GF’s Nanjing presentation shows all the boxes ticked: 22FDX® is qualified for volume production. (Courtesy: GlobalFoundries and the SOI Consortium)

Zhi Yong Han also highlighted the excellent performance of GF’s RF-SOI offering, and the huge capacity they’re building out. NB-IoT clients are now approaching them, he added.

Samsung: World’s 1st eMRAM Test Chip

“E.S. stands for Engineering Sample,” quipped Dr. E.S. Jung, EVP/GM of the foundry business for Samsung Electronics. A very energetic speaker, his talk covered Cutting Edge Technology from a Trusted Foundry. (Samsung Foundry is now a standalone business unit.)

Samsung has seven major 28nm FD-SOI customers, and has taped out over 40 products. This coming year a number of products will be taking off in mass production, he said.

eMRAM (which only required three additional mask steps) is the newest addition to the family of embedded non-volatile memories and it offers unprecedented speed, power and endurance advantages (see the press release here).

Regarding back bias in the IP, he said they’ve solved it working with their suppliers, EDA vendors and customers. Migrations will re-use that IP.

At the Nanjing SOI forum, VP of Samsung Foundry Suk Won Kim looked at design methodology in his talk, 28FDS Samsung Foundry Platform. It’s easy to implement your SoC with FD-SOI technology, he said, explaining how PPA and cost/transistor makes 28FDS an optimal node. The PDK – including RF – are ready for high volume production. There is no design overhead: the differences between FD-SOI and bulk are not difficulties, he emphasized.

For 28FDS, the full spectrum of the ecosystem is available: design enablement, advanced design methodologies, and silicon-proven IP. Samsung has a body bias generator, and the design methodology takes care of checking the body bias integrity. In terms of the physical design, there is awareness in the floorplan for body biasing and flip-well devices. In terms of timing sign-off, there’s almost no change – in fact there are fewer PVT corners. The flow for power integrity sign-off doesn’t change. The RTL-to-GDS flow is about the same – and where they diverge, designers are embracing the differences.

And for those looking ahead, the PDK for 18FDS evaluation will be available soon.

More pics?

For pics of many more slides, check out articles posted about the SOI forums in the China press, including EETimes China, EEFocus, and EDN China (plus see their focus piece).

BTW, there were five days of events in Shanghai and Nanjing, with over 50 presentations  given in ballrooms full-to-bursting. As noted in my previous post, China FD-SOI/RF-SOI Presentations Posted; Events Confirm Tremendous Growth, many (but not all) of the presentations are now available  in the Events section here on the SOI Consortium website.

So in future posts, we’ll cover the EDA/IP companies, design tutorials and user presentations for both the FD-SOI and RF-SOI China events — including those not posted. Stay tuned!

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