If you’re going to Semicon West this year, be sure to attend the SOI Consortium’s workshop on how IoT is driving the SOI supply chain. There’s a great line-up of speakers – see the program below.
IoT means many things to many people but everyone agrees it’s here and growing quickly. IoT, including machine learning and movement to the edge, is fueling innovation as the high compute and ultra-low energy requirements are pushing technology to deliver on these needs. The well-known characteristics defining IoT of “Sense”, “Compute”, and “Act” put additional burden on technology to full these requirements across a variety of use cases and environments without sacrificing reliability or quality.
All the various forms of SOI technology from FD-SOI to High-Voltage to RF-SOI, are uniquely situated to deliver on the promise of today’s as well as tomorrow’s IoT roadmap. The supply chain for all forms of SOI technology is in place. This workshop will discuss the current and future solutions from a supply chain perspective.
Speakers include experts from SOI Consortium members Applied Materials, NXP, GlobalFoundries and Soitec.
Entitled The Internet of Things, Driver of the SOI Supply Chain, the workshop will take place at the Moscone Center South, Wednesday July 10th in Room 301. It will run from 1 pm until 4:30 pm. Anyone and everyone who is registered for Semicon West is welcome. Here is the sign-up page.
It’s a great program:
1:00pm – Welcome by Semi
1:10pm – IoT/AI/Edge Market – Using SOI Through-out, Jon Cheek, Senior Director, NXP
1:35pm – The SOI Opportunity, Manish Hemkar, Director, Semiconductor Products Group, Applied Materials
2:00pm – The Foundry IP Ecosystem, Jamie Schaeffer, Sr. Director, GlobalFoundries
2:25pm – Engineered Substrates – Enabling the IoT Revolutions, Eunseok Park, Director, Emerging Technology in Strategic Marketing, Soitec
2:50pm – Enabling the SOI Era, Thomas Uhrmann, Head of Business Development, EVG
3:15pm – Panel: The Internet of Things, Driver of the SOI Supply Chain, Moderator: Carlos Mazure, Chairman, SOI Industry Consortium. Panelists include:
4:05pm – Closing remarks, Carlos Mazure, Chairman, SOI Industry Consortium
4:20pm – End
This is a great chance to learn more about SOI and the SOI Consortium. Don’t miss it!
And while you’re at West, you should also check out a related event. SOI Consortium member Leti will be teaming up with Fraunhofer for a workshop entitled New Paradigms in Microelectronics–Providing R&D for the 21st Century. That happens at the nearby W Hotel in San Francisco on Tuesday, July 9th at 5:00pm. Click here for more information on that.
Join us! In partnership with our members, the SOI Consortium is co-organizing and participating in two key SOI events coming up in China over the next few weeks. On May 18th, we’ve put together an SOI Forum at the World Semiconductor Congress (WCS) in Nanjing. And on May 23rd & 24th, we’ve teamed up with our members SIMIT, Sitri and Leti for another in our series of SOI Academies, including an FD-SOI Training Day. (The last one this past winter was a terrific success – read about that here if you missed our coverage at the time.)
At WCS, the SOI Forum (sub-forum #8) is part of the afternoon Innovation Summit. We’ll cover the broader SOI ecosystem, including both RF-SOI and FD-SOI – from wafers to design through manufacturing. Presentations will be given by members of the SOI Consortium team, and by leaders from our membership, including Simgui, NXP, Incize, ST, IBM, Cadence and Xpeedic. Click here or scan the QR code for the full program and registration information.
Also at WCS, SOI Consortium member VeriSilicon will be participating in a morning session on AI and IoT Wireless Communications (sub-forum #4). They’ll be giving a presentation on their low-power Bluetooth design platform for GlobalFoundries 22FDX, and their CEO Wayne Dai will be moderating a round-table discussion. You can get more information on that (in Chinese only, tho) here, or follow VeriSilicon on WeChat.
The SOI Academy in Shanghai is an opportunity for experienced designers to gain solid expertise in FD-SOI. The event begins in the afternoon of May 23rd with a series of informative plenary talks by members of the SOI Consortium team, and by experts from our members Leti, Soitec, VeriSilicon, GlobalFoundries and NXP. The FD-SOI Training starts the next morning, on May 24th.. This is a hands-on event lead by top experts from Leti. The morning is devoted to digital design in FD-SOI, and the afternoon to RF design (including for 5G) in FD-SOI. Attendees will get a comprehensive understanding of design techniques for low-power chips leveraging the multiple benefits and flexibility of FD-SOI technology. Get more information here, or from the WeChat QR code.
We’ve got a busy schedule! To keep up to date with where we and our members will be promoting the SOI ecosystem, be sure to check our Events page regularly.
For the second consecutive year the SOI Consortium will have a stand at the Networking Reception during the Samsung Foundry Forum (SFF). This important Silicon Valley event will be held on May 14, 2019 at the Santa Clara Marriott. We hope you’ll stop by to learn more about the SOI Consortium and the FD-SOI ecosystem.
There’s been a steady stream of news about Samsung’s FD-SOI offerings and support, including their highly successful 28FDS and coming very soon: 18FDS. (If you need to catch up, click here to read more.) As in the previous 3 years, Samsung will be making major announcements on their technology roadmap and application solutions. SFF is a unique opportunity to network with Korean and US based executives from Samsung Foundry as well as customers and ecosystem partners.
SOI Consortium members ARM, Synopsys, Cadence, Analog Bits, VeriSilicon and Xpeedic will also have stands, and NXP will be on the customer panel.
Seats are limited, so go to http://www.samsungfoundryforum.com/2019/ to register now.
Key takeaway #2: If you need a Goldilocks process node – where you’ll get just the right balance between active power, unit cost and investment – look to FD-SOI. And, btw, the IP landscape has improved dramatically. Those were just some of the great points made by Huibert Verhoeven (shown above), GM/SVP of Synaptics’ IoT Division in his talk at the recent SOI Symposium in Silicon Valley.
BTW, if you missed part 1 of our coverage —Silicon Valley SOI Symposium a Huge Success. Key Takeaways (Part 1) Here. – you’ll want to be sure to read it, too. Almost all of the presentations are now posted on our website – click here to access them.
In this post here, we’ll cover presentations by Synaptics, GlobalFoundries, STMicroelectronics, Anokiwave and Dolphin Integration. It was a really full, day, so be sure to stay turned for Part 3 of our coverage to follow shortly: it will highlight the remaining presentations and panel discussions.
Synaptics’ Verhoeven’s presentation Revolutionizing User Experience Through Secure Neural Network Acceleration at the Edge was about Smart Home and using SOI. Synaptics is a human interface (HMI) company that’s been doing neural networks since 1986. They’ve always been on the leading edge, from their first shipment of PC touchpads to becoming a dominant force in all things HMI today: they now ship over a billion units annually.
They currently have SOI products shipping with dedicated neural networks for voice, he said. European [privacy] regulations have played a part in driving their use of SOI, as have challenges regarding power and heat. Things are getting smarter at the edge. For example, not only do users want their coffee machine to offer the usual morning espresso, Synaptics says that the next step is for your coffee machine to recognize you’re looking extra tired and ask if you might want a double?!
For them Smart Home and multi-modal applications are the primary area of interest, as well as some automotive. Although their biggest customers have resources, others need guidance. Voice is a critical component, but now you also need video and display.
Why SOI? Their HMI vision requires low power, significant computation and dedicated neural network hardware, explained Verhoeven, so FD-SOI with RF meets their needs. “22nm SOI is a Goldilocks IoT Process Node,” he proclaimed. It gets the combination of active power, unit cost and investment just right. What’s more, he said, “The IP landscape has improved dramatically. Our choice of SOI was not an accident.” Be on the lookout for more products leveraging FD-SOI over the next six months, he concluded.
At this point on SOI, they’ve got 1 TOPS products with dedicated NPU for speakers, soundbars, Wi-Fi mesh, appliances, STBs and smart displays. These products have voice and sensor real-time (RT) AI. Next up is >4 TOPS on SOI with dedicated NPU, targeting STBs and smart displays with voice, video, imaging and RT AI.
“Our clients are at the forefront of changing the world,” declared Mark Granger, VP of the Automotive Product Line at GlobalFoundries. His presentation, Capturing High Growth Market Opportunities with SOI, detailed how mobility, automotive and IoT are the growth markets for SOI. So not unsurprisingly, GF’s 22nm FD-SOI technology, 22FDX, is seeing particular traction in mobile, edge, wearables and automotive.
They’ve got twice as many tape-outs this year as they did a year ago, he noted. GF’s SOI portfolio includes 22FDX®, 45RFSOI and 8SW/7SW RF SOI for 5G/mobility; 22FDX for automotive (fully qualified for automotive Grade 2, with Grade 1 on the way); and 22FDX, 130RFSOI and 8SW/7SW RF SOI for IoT.
GF has announced a stream of good news recently:
You might have heard about the Dolphin Integration news, as we covered it recently here at ASN (if not, be sure to read it here). Dolphin’s IP and methodology solutions address energy efficiency challenges. Automated transistor body biasing adjustment can achieve up to 7x energy efficiency with power supply as low as 0.4V on 22FDX designs. At the Silicon Valley event, Dolphin Integration CEO Philippe Berger provided additional information in his talk, FD-SOI IP Platform for Energy-Efficient IoT SoC.
In another GF-related talk, Nitin Jain, the CTO of longtime GF RF-SOI customer Anokiwave presented Unleashing the mmWave Phase Array Using SOI for 5G & Satcom. Anokiwave is a fabless semi IC company (you’ll find a good technical discussion of mmWave phase array written by their Chief Architect here). They do active antennas (aka phased array), something the military’s done for a long time, but now Anokiwave is bringing it to new markets and applications including radar, satcom and 5G. What they’ve been able to do is planarize the active antennas. They use GF’s 45RFSOI process technology for phased array systems because of the cost, performance, scalability and system enhancements it enables. 45RFSOI, he explained, is ideal for beam-forming FEMs (including the switches, LNAs and PAs). The move to 5G/mmWave is going to require a lot of antennas, so these Anokiwave ICs are headed to high volumes, concluded Jain.
As Roger Forchhammer, Director of Business Development at STMicroelectronics pointed out in his presentation, Automotive FD-SOI Microcontrollers with Embedded PCM, ST pioneered FD-SOI (and that was almost a decade ago, btw). Then in February 2019, they announced a world first: they’d begun sampling 28nm FD-SOI microcontrollers (MCUs) with embedded non-volatile memory (eNVM) based on embedded Phase-Change Memory (ePCM) to 10 alpha customers. These MCUs target powertrain systems, advanced and secure gateways, safety/ADAS applications, and vehicle electrification.
(In case you want technical details, the breakthrough ePCM eNVM was first presented at IEDM in December 2018 – you can get the presentation that accompanied the paper, Truly Innovative 28nm FDSOI Technology for Automotive Microcontroller Applications embedding 16MB Phase Change Memory, from the ST website.)
In his Silicon Valley presentation, Forchhammer said they’re now doing Stellar, a whole family of automotive products on FD-SOI. To do it, they’d taken an existing device and moved it to 28nm FD-SOI with ePCM, which they manufacture at their fab in Crolles, France. A major advantage for automotive he cites is that in software updates it’s bit-level programmable. “ST is fully behind FD-SOI,” he concluded, adding that we’re see more automotive as well as IoT products coming soon.
Well folks, that’s all for this post. We’ll finish up our coverage of the SOI Consortium’s 2019 Silicon Valley Symposium in the next ASN post (there was so much to cover!). So please stay tuned.
Two of the big, recent breakthroughs in memory technology – eMRAM and ePCM – have gotten their start in volume manufacturing on 28nm FD-SOI. In conjunction with the 2019 IEEE International Memory Workshop, SOI Consortium members Leti and Applied Materials have teamed up to give a technical program to explore short-term and long-term memory solutions. While the workshop is not specific to SOI, given the recent foundry announcements about ePCM and eMRAM for FD-SOI, the organizers predict it will be of particular interest to those following the greater SOI ecosystem. The event takes place at the end of the Sunday IMW tutorial day, starting at 5:30pm at the Hyatt Regency in Monterey, CA. Please see this page for the program and registration information.
Here is the program:
Jean-Eric Michallet, Head of Leti’s Microelectronics Components Department, Silicon Component Division is one of the organizers. Here is his overview:
FD-SOI is expected to be a long-lived technology. It enables planar CMOS scaling and accommodates a great deal of More-than-Moore developments where its ability for low power and great analog performance can make a difference for IoT, Automotive, Machine Learning or 5G applications. But to do this it requires a high-performance and cost-effective non-volatile embedded memory option. The incumbent Flash cell is reaching the end of its roadmap due to the difficulty of shrinking the bitcell and manufacturing, as well as the finished wafer cost increase. Back-end integrated Random Access Memory in advanced CMOS process has been explored for many years now as a competitive solution for fast-write and low-voltage non-volatile embedded memories. Foundry availability of embedded Magnetic RAM and Phase Change RAM for FDSOI 28nm platforms has been announced recently, showing that these technologies have now reached industrial maturity. CEA-Leti and Applied Materials invite you to attend a technical program to explore short-term and long-term memory solutions, from early research to industrialization.
Registration is open, free, and available to all IMW attendees, and others. However, as seating is limited and as we have already several participants pre-registered, registration is by invitation only and early registration is recommended. If you are interested, please email Jean-Eric Michallet.
The event is presented in conjunction with the 2019 IEEE International Memory Workshop, to be held on Sunday, May 12th, 2019, Hyatt Regency, Monterey CA, starting at 5:30 pm.
GlobalFoundries and Dolphin Integration are collaborating on the development of a series of adaptive body bias (ABB) solutions to improve the energy efficiency and reliability of SoCs on GF’s 22nm FD-SOI (22FDX®) process technology for a wide range of high-growth applications such as 5G, IoT and automotive. The goal of the IP is to accelerate energy-efficient SoC designs and push the boundaries of single-chip integration. The design kits with turnkey ABB solutions will be available starting in Q2 2019.
As part of the collaboration, Dolphin and GF are working together to develop a series of off-the-shelf ABB solutions for accelerating and easing body bias* implementation on SoC designs. ABB is a unique feature of FD-SOI that enables designers to leverage forward and reverse body bias techniques to dynamically compensate for process, supply voltage, temperature (PVT) variations and aging effects to achieve additional performance, power, area and cost improvements beyond those from scaling alone.
The ABB solutions in development by GF and Dolphin consist of self-contained IPs embedding the body bias voltage regulation, PVT and aging monitors and control loop as well as complete design methodologies to fully leverage the benefits of corner tightening. GF says its 22FDX technology offers the industry’s lowest static and dynamic power consumption. With automated transistor body biasing adjustment, Dolphin Integration can achieve up to 7x energy efficiency with power supply as low as 0.4V on 22FDX designs.
“We have been working with GF for more than two years on advanced and configurable power management IPs for low power and energy efficient applications,” said Philippe Berger, CEO of Dolphin Integration. “Through our ongoing collaboration with GF, we are focused on creating turnkey IP solutions that allow designers to realize the full benefit of FD-SOI for any SoC design in 22FDX.”
“In order to simplify our client designs and shorten their time-to-market, GF and our ecosystem partners are helping to pave the way to future performance standards in 5G, IoT and automotive,” said Mark Ireland, vice president of ecosystem partnerships at GF. “With the support of silicon IP providers like Dolphin Integration, new power, performance and reliability design infrastructures will be available to customers to fully leverage the benefits of GF’s 22FDX technology.”
As STMicroelectronics Fellow and Professor Andreia Cathelin has beautifully noted, “Body biasing is not an obligation. It’s an opportunity.” And GF/Dolphin clearly aim to make that opportunity a much easier and more powerful one to take advantage of.
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*A note on terminology: the terms back bias and body bias are used interchangeably. Likewise the terms adaptive and dynamic when used in the FD-SOI context. Here is a quick explanation of how it works, from an ST paper from several years ago:
Back-biasing consists of applying a voltage just under the BOX of target transistors. Doing so changes the electrostatic control of the transistors and shifts their threshold voltage VT, to either get more drive current (hence higher performance) at the expense of increased leakage current (forward back-bias, FBB) or cut leakage current at the expense of reduced performance. While back-bias in planar FD is somewhat similar to body-bias that can be implemented in bulk CMOS technology, it offers a number of key advantages in terms of level and efficiency of the bias that can be applied. Back-biasing can be utilized in a dynamic way, on a block-by-block basis. It can be used to boost performance during the limited periods of time when maximum peak performance is required from that block. It can also be used to cut leakage during the periods of time when limited performance is not an issue. In other words, back-bias offers a new and efficient knob on the speed/power trade-off.
For another good discussion of body biasing in FD-SOI, you might want to check out The Return Of Body Biasing by Semiconductor Engineering’s Ann Steffora Mutschler from a couple years ago.
Since about a third of all IoT devices are expected to be connected by Bluetooth, chip designers need IP solutions that will help reduce system cost and greatly improve battery life. And that’s just what VeriSilicon has announced for GlobalFoundries’ 22FDX® (FD-SOI) process.
“By taking advantage of integrated RF capabilities of FD-SOI, in particular GF’s 22FDX, our BLE 5.0 RF IP will significantly reduce the system cost and greatly boost the growth momentum of wearable products such as wireless earplugs,” said Dr. Wayne Dai, Founder, Chairman, President and CEO of VeriSilicon. 22FDX enables efficient single-chip integration of RF, transceiver, baseband, processor, and power management components. GF and VeriSilicon are working on an SoC using VeriSilicon’s BLE 5.0 RF IP in GF’s 22FDX process.
The latest iteration of Bluetooth is 5, which (like its predecessor 4) has a Low Energy (LE) RF option – but with big improvements. According to the Bluetooth website, “With 4x range, 2x speed and 8x broadcasting message capacity, the enhancements of Bluetooth 5 focus on increasing the functionality of Bluetooth for the IoT.” BLE 5.0 was designed for very low power operation and is optimized for the sorts of short burst data transmissions you’ll get with IoT.
On the strength of VeriSilicon’s innovative RF architecture and by leveraging GF’s 22FDX technology, VeriSilicon says the new IP product achieves significant improvements in power, area, and cost compared to current offerings, so it will better serve the emerging and increasing wearable devices and IoT applications space.
“VeriSilicon’s BLE IP complements GF’s 22FDX FD-SOI capabilities and is well positioned to support the explosive growth of low-power IoT and connected devices,” said Mark Ireland, vice president of ecosystem partnerships at GF. “Together, we broaden our IP and services to further enable our mutual clients to provide power and cost efficient solutions.”
VeriSilicon BLE 5.0 RF IP includes a transceiver that is compliant with the BLE 5.0 specification and supports GFSK modulation and demodulation. The silicon measurement shows that the sensitivity can be tested up to -98dBm with less than 7mW power dissipation in typical conditions. It largely improves battery life for low power IoT applications. In addition, the RF transceiver saves 40% area compared to a similar implementation on 55nm bulk CMOS. Besides the RF transceiver, this IP integrates on-chip balun, TX/RX switch and 32K RC OSC driver to save the BOM. Moreover, high efficiency DC/DC and LDOs are also available for power management.